Executive Development Programme in Patent Law and Compliance
-- ViewingNowThe Executive Development Programme in Patent Law and Compliance is a certificate course designed to empower professionals with the necessary skills to excel in the patent industry. This program focuses on patent law fundamentals, patent prosecution, IP rights, and compliance, making it essential for career advancement in this field.
3,067+
Students enrolled
GBP £ 140
GBP £ 202
Save 44% with our special offer
ě´ ęłźě ě ëí´
100% ě¨ëźě¸
ě´ëěë íěľ
ęłľě ę°ëĽí ě¸ěŚě
LinkedIn íëĄíě ěśę°
ěëŁęšě§ 2ę°ě
죟 2-3ěę°
ě¸ě ë ěě
ë기 ę¸°ę° ěě
ęłźě ě¸ëśěŹí
⢠Introduction to Patent Law: Understanding the basics of patent law, including the purpose, types of patents, and the patent application process.
⢠Patent Search and Analysis: Learning how to conduct a comprehensive patent search, analyze search results, and understand the significance of prior art.
⢠Drafting a Patent Application: Gaining knowledge on the key elements of a patent application, including the specification, claims, and drawings, and understanding how to draft each section effectively.
⢠Patent Prosecution: Understanding the patent prosecution process, including office actions, responses, and appeals, and learning how to navigate the process successfully.
⢠Patent Enforcement and Litigation: Learning about patent enforcement strategies, litigation processes, and alternative dispute resolution methods.
⢠Patent Compliance and Ethics: Understanding the ethical considerations in patent law, including conflicts of interest, attorney-client privilege, and professional responsibility.
⢠IP Portfolio Management: Learning how to manage an intellectual property portfolio, including strategies for patent filing, maintenance, and licensing.
⢠Emerging Trends in Patent Law: Keeping up-to-date with the latest developments and trends in patent law, including changes in legislation, court decisions, and technology advancements.
ę˛˝ë Ľ 경ëĄ
ě í ěęą´
- 죟ě ě ëí 기본 ě´í´
- ěě´ ě¸ě´ ëĽěë
- ěť´í¨í° ë° ě¸í°ëˇ ě ꡟ
- 기본 ěť´í¨í° 기ě
- ęłźě ěëŁě ëí íě
ěŹě ęłľě ěę˛Šě´ íěíě§ ěěľëë¤. ě ꡟěąě ěí´ ě¤ęłë ęłźě .
ęłźě ěí
ě´ ęłźě ě ę˛˝ë Ľ ę°ë°ě ěí ě¤ěŠě ě¸ ě§ěęłź 기ě ě ě ęłľíŠëë¤. ꡸ę˛ě:
- ě¸ě ë°ě 기ę´ě ěí´ ě¸ěŚëě§ ěě
- ęśíě´ ěë 기ę´ě ěí´ ęˇě ëě§ ěě
- ęłľě ě겊ě ëł´ěě
ęłźě ě ěąęłľě ěźëĄ ěëŁí늴 ěëŁ ě¸ěŚě뼟 ë°ę˛ ëŠëë¤.
ě ěŹëë¤ě´ ę˛˝ë Ľě ěí´ ě°ëŚŹëĽź ě ííëę°
댏롰 ëĄëŠ ě¤...
ě죟 돝ë ě§ëŹ¸
ě˝ě¤ ěę°ëŁ
- 죟 3-4ěę°
- 쥰기 ě¸ěŚě ë°°ěĄ
- ę°ë°Ší ëąëĄ - ě¸ě ë ě§ ěě
- 죟 2-3ěę°
- ě 기 ě¸ěŚě ë°°ěĄ
- ę°ë°Ší ëąëĄ - ě¸ě ë ě§ ěě
- ě 체 ě˝ě¤ ě ꡟ
- ëě§í¸ ě¸ěŚě
- ě˝ě¤ ěëŁ
ęłźě ě ëł´ ë°ę¸°
íěŹëĄ ě§ëś
ě´ ęłźě ě ëšěŠě ě§ëśí기 ěí´ íěŹëĽź ěí ě˛ęľŹě뼟 ěě˛íě¸ě.
ě˛ęľŹěëĄ ę˛°ě ę˛˝ë Ľ ě¸ěŚě íë
